Physical Vapor Deposition (PVD) is a method for producing metal-based hard coatings by means of generation of partially ionized metal vapor, its reaction with certain gases and by forming a thin film with a specified composition on the substrate. Most commonly used methods are sputtering and cathodic arc. In sputtering, the vapor is formed by a metal target being bombarded with energetic gas ions. Cathodic arc method uses repetitive vacuum arc discharges to strike the metal target and to evaporate the material.