Plasma etching - PTFE


Plasma Etching is the removal of plastic, silicon, or other non-metallic material using plasma created by exciting ions in a gas, usually oxygen and CF4. The excited ions collide with the material at the atomic level and remove it without the need for chemical etchants.

PlasmaEtch work hard to provide superior plasma etching solutions for virtually all applications, and PlasmaEtch are proud to say that they have some of the most effective systems in the industry. Controlling ion density, electron temperature, and the plasma potential are of the utmost importance for ensuring a uniform etching process.


PlasmaEtch have both conventional etching systems as well as reactive ion etching systems that are built-to-order and can be thoroughly customized. Companies depend on PlasmaEtch plasma treatment systems to deliver fast, high quality etching, mitigate plasma damage, and provide unparalleled uniformity.

Many of PlasmaEtch plasma etching machines are used for dry etching on a daily basis.

PlasmaEtch technology is currently being used in industry for the etching of Polytetrafluoroethylene (PTFE).

PlasmaEtch build a wide range of plasma etching systems to ensure that your size and volume requirements are covered. Most of PlasmaEtch base platforms can be configured and customized specifically to the customer’s individual needs. 

Possible replacement to

The use of DiGlyme.

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